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1992
Wong, K. C. ; Ogryzlo, E. A. Rate Constants For The Etching Of Gallium-Arsenide By Molecular-Iodine. Journal of Vacuum Science & Technology B 1992, 10, 668-674.
1991
Huang, D. G. ; Blades, M. W. Characterization Of An Atmospheric-Pressure Parallel-Plate Capacitively Coupled Radiofrequency Plasma. Applied Spectroscopy 1991, 45, 1468-1477.
Walker, Z. H. ; Ogryzlo, E. A. Rate Constants For The Etching Of Intrinsic And Doped Polycrystalline Silicon By Bromine Atoms. Journal of Applied Physics 1991, 69, 2635-2638.
Salusbury, I. M. ; Ogryzlo, E. A. Rate Constants For The Reaction Of Atomic And Molecular Bromine With Gallium-Arsenide. International Journal of Chemical Kinetics 1991, 23, 529-539.
Walker, Z. H. ; Ogryzlo, E. A. Rate Constants For The Reaction Of Cl Atoms With Intrinsic And N+-Doped Polycrystalline Silicon. Journal of Applied Physics 1991, 69, 548-549.