Export 5 results:
Filters: Keyword is CHLORINE [Clear All Filters]
Rate Constants For The Etching Of Gallium-Arsenide By Molecular-Iodine. Journal of Vacuum Science & Technology B 1992, 10, 668-674.
Characterization Of An Atmospheric-Pressure Parallel-Plate Capacitively Coupled Radiofrequency Plasma. Applied Spectroscopy 1991, 45, 1468-1477.
Rate Constants For The Etching Of Intrinsic And Doped Polycrystalline Silicon By Bromine Atoms. Journal of Applied Physics 1991, 69, 2635-2638.
Rate Constants For The Reaction Of Atomic And Molecular Bromine With Gallium-Arsenide. International Journal of Chemical Kinetics 1991, 23, 529-539.
Rate Constants For The Reaction Of Cl Atoms With Intrinsic And N+-Doped Polycrystalline Silicon. Journal of Applied Physics 1991, 69, 548-549.