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  3. ROOM-TEMPERATURE DEPOSITION OF DIAMOND-LIKE CARBON-FILMS BY THE MICROWAVE PLASMA-JET METHOD

ROOM-TEMPERATURE DEPOSITION OF DIAMOND-LIKE CARBON-FILMS BY THE MICROWAVE PLASMA-JET METHOD

TitleROOM-TEMPERATURE DEPOSITION OF DIAMOND-LIKE CARBON-FILMS BY THE MICROWAVE PLASMA-JET METHOD
Publication TypeJournal Article
Year of Publication1994
AuthorsMehta, BR, Ogryzlo, EA
JournalDiamond and Related Materials
Volume3
Pagination10-13
Date PublishedJan
Type of ArticleArticle
ISBN Number0925-9635
KeywordsGROWTH
Abstract

Modifications have been incorporated in the conventional microwave-assisted chemical vapour deposition process to deposit diamond-like carbon (DLC) coatings on polycarbonate substrates. In the modified method, the substrates to be coated are placed outside the plasma chamber. An electric field is applied across the microwave discharge. The accelerated ionic species leave the nozzle and bombard the substrates placed in a separate chamber. Using the present technique, DLC films have been deposited on silicon and polycarbonate substrates. These films show chemical inertness and hardness values in the range 15-19.5 GPa.
URL<Go to ISI>://A1994MP06000003