Title | A capacitively coupled microplasma (CC mu P) formed in a channel in a quartz wafer |
Publication Type | Journal Article |
Year of Publication | 2001 |
Authors | Bass, A, Chevalier, C, Blades, MW |
Journal | Journal of Analytical Atomic Spectrometry |
Volume | 16 |
Pagination | 919-921 |
Date Published | Sep |
Type of Article | Proceedings Paper |
ISBN Number | 0267-9477 |
Keywords | ANALYSIS SYSTEMS, ATMOSPHERIC-PRESSURE, EMISSION DETECTOR, GAS-CHROMATOGRAPHY, MICROSTRIP TECHNOLOGY, PLASMA SOURCE, SPECTROMETRY |
Abstract | An optical emission plasma source with dimensions as small as 0.25 x 0.25 x 5 mm has been implemented on a quartz wafer. The He plasma, formed using a parallel plate, capacitively coupled geometry, operates at atmospheric pressure, uses a 13.56 MHz power source at 5-25 W, with gas flows between 17-150 mL min (1), and is self-igniting. Parallel-plate capacitive power coupling is nearly ideal for generating and sustaining a plasma discharge "on a chip" since it can be implemented using a very simple electrode structure and does not require tuned or resonant structures. |
URL | <Go to ISI>://000171287600003 |
