| Title | APPLICATION OF WEAKLY IONIZED PLASMAS FOR MATERIALS SAMPLING AND ANALYSIS |
| Publication Type | Journal Article |
| Year of Publication | 1991 |
| Authors | Blades, MW, Banks, P, Gill, C, Huang, DG, Leblanc, C, Liang, D |
| Journal | Ieee Transactions on Plasma Science |
| Volume | 19 |
| Pagination | 1090-1113 |
| Date Published | Dec |
| Type of Article | Review |
| ISBN Number | 0093-3813 |
| Keywords | ARGON PLASMA, ATMOSPHERIC-PRESSURE, ATOMIC EMISSION-SPECTROSCOPY, DC, FLUORESCENCE SPECTROMETRY, GLOW-DISCHARGE SOURCE, HOLLOW-CATHODE DISCHARGE, INDUCTIVELY-COUPLED PLASMA, MICROWAVE-INDUCED PLASMAS, NONTHERMAL EXCITATION, SOURCE-MASS SPECTROMETRY, SPECTROMETRY |
| Abstract | The use of weakly ionized plasmas as spectroscopic sources for materials sampling and analysis is reviewed. Plasma sources currently used for this purpose include dc and ac plasmas, inductively coupled plasmas, microwave-induced plasmas, surface-wave plasmas, capacitively coupled plasmas, capacitive microwave plasmas, glow discharges, flowing afterglows, Theta pinch discharges, exploding films and wires, and laser-produced plasmas. |
| URL | <Go to ISI>://A1991HD29500009 |
