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A capacitively coupled microplasma (CC mu P) formed in a channel in a quartz wafer

TitleA capacitively coupled microplasma (CC mu P) formed in a channel in a quartz wafer
Publication TypeJournal Article
Year of Publication2001
AuthorsBass, A, Chevalier, C, Blades, MW
JournalJournal of Analytical Atomic Spectrometry
Volume16
Pagination919-921
Date PublishedSep
Type of ArticleProceedings Paper
ISBN Number0267-9477
KeywordsANALYSIS SYSTEMS, ATMOSPHERIC-PRESSURE, EMISSION DETECTOR, GAS-CHROMATOGRAPHY, MICROSTRIP TECHNOLOGY, PLASMA SOURCE, SPECTROMETRY
Abstract

An optical emission plasma source with dimensions as small as 0.25 x 0.25 x 5 mm has been implemented on a quartz wafer. The He plasma, formed using a parallel plate, capacitively coupled geometry, operates at atmospheric pressure, uses a 13.56 MHz power source at 5-25 W, with gas flows between 17-150 mL min (1), and is self-igniting. Parallel-plate capacitive power coupling is nearly ideal for generating and sustaining a plasma discharge "on a chip" since it can be implemented using a very simple electrode structure and does not require tuned or resonant structures.

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