@article {7356,
	title = {THE DYNAMICS OF HOT-F ATOMS IN LOW-PRESSURE PLASMA-ETCHING REACTORS},
	journal = {Chemical Physics},
	volume = {166},
	number = {3},
	year = {1992},
	note = {ISI Document Delivery No.: JR214Times Cited: 2Cited Reference Count: 26},
	month = {Oct},
	pages = {317-328},
	type = {Article},
	abstract = {The time dependent distribution function of translationally energetic F atoms produced by electron impact dissociative collisions with CF4 in a low pressure CF4 plasma is determined from the solution of the Boltzmann equation. The hot F atom distribution function departs from equilibrium owing to the strength and energy distribution of the source atoms and is driven to equilibrium via F-CF4 elastic collisions. The extent of the departure from equilibrium depends on the rate of production of hot F atoms by reaction and the rate of thermalization by elastic collisions. The time dependent hot F distribution function is determined from the Boltzmann equation for an initial non-equilibrium distribution, with and without a steady source. The differential elastic collision cross section for F-CF4 collisions, that defines the collision operator in the Boltzmann equation, is calculated quantum mechanically. The phase shifts are determined with the WKB approximation for an appropriate Lennard-Jones 6-12 potential for the F-CF4 interaction. The results of these calculations suggest that hot neutral F radicals may contribute to the etching process and be competitive with ion activated etching. The enhancement of reaction rates owing to energetic F atoms is also determined and compared with the corresponding thermal rates.},
	keywords = {ATMOSPHERE, DISCHARGES, GAS},
	isbn = {0301-0104},
	url = {<Go to ISI>://A1992JR21400003},
	author = {Shizgal, B. and Clarke, A. S.}
}
@article {7108,
	title = {A UNIFORM WKB ANALYSIS OF THE COUPLING OF ELECTRON-ATTACHMENT AND THERMALIZATION IN GASES},
	journal = {Journal of Physics B-Atomic Molecular and Optical Physics},
	volume = {24},
	number = {13},
	year = {1991},
	note = {ISI Document Delivery No.: FX594Times Cited: 11Cited Reference Count: 44},
	month = {Jul},
	pages = {2909-2923},
	type = {Article},
	abstract = {The presence of small amounts of strongly electronegative gases such as SF6 and CCl4 can greatly perturb from equilibrium the electron energy distribution function in a variety of electron devices. The effect of the addition of these electron attaching gases on the relaxation behaviour of a non-equilibrium electron distribution is studied with a linear Fokker-Planck equation. The time dependence of the electron mobility as well as other transport properties can be expressed as a sum of exponential terms with each term characterized by an eigenvalue of the Fokker-Planck operator. This eigenvalue problem can be transformed to a Schrodinger equation with a potential function parametrized by the electron-atom cross sections, the electric field strength and the gas temperature. In the present paper, the eigenvalues and eigenfunctions are calculated with a WKB semiclassical approximation and compared with exact results. The application of the WKB approximation provides a useful way to calculate these strongly perturbed distributions. The specific applications in this paper are for the relaxation of electrons in the inert gases in the presence of small amounts of SF6 or CCl4.},
	keywords = {CROSS-SECTIONS, DISCHARGES, FOKKER-PLANCK EQUATION, MIXTURES, MODERATORS, RARE, relaxation, SF6, SWARM DEVELOPMENT, TRANSPORT-COEFFICIENTS},
	isbn = {0953-4075},
	url = {<Go to ISI>://A1991FX59400007},
	author = {Shizgal, B.}
}
