@article {1282,
	title = {Pre-treatments applied to oxidized aluminum surfaces to modify the interfacial bonding with bis-1,2-(triethoxysilyl)ethane (BTSE) - Part I. High-purity Al with native oxide},
	journal = {Applied Surface Science},
	volume = {252},
	number = {5},
	year = {2005},
	note = {ISI Document Delivery No.: 993WHTimes Cited: 5Cited Reference Count: 39},
	month = {Dec},
	pages = {1293-1304},
	type = {Article},
	abstract = {A remote microwave-generated H-2 plasma and heating to 250 degrees C were separately used to modify high-purity oxidized aluminum surfaces and to assess whether these treatments can help enhance adhesion with bis-1,2-(triethoxysilyl)ethane (BTSE) coatings. Different initial oxide surfaces were considered, corresponding to the native oxide and to surfaces formed by the Forest Products Laboratory (FPL) treatment applied for either 15 or 60 min. BTSE is applied from solution at pH 4, and competing processes of etching, protonation (to form OH groups) and coupling (to form Al-O-Si interfacial bonds) occur at the solid-liquid interface. Scanning electron microscopy (SEM) was used to determine how the topographies of the modified Al surfaces changed with the different pre-treatments and with exposure to a buffer solution of pH 4. Secondary-ion mass spectrometry (SIMS) was used to determine the direct amount of Al-O-Si interfacial bonds by measuring the ratio of peak intensities 71-70 amu, while X-ray photoelectron spectroscopy (XPS) was used to determine the overall strength of the silane coating adhesion by measuring the Si 2p signals before and after application of an ultrasonic rinse to the coated sample. Measured Al 2p and O 1s spectra helped assess how the different pre-treatments modified the various Al oxidized surfaces prior to BTSE coating. Pre-treated samples that showed increased Al-O-Si bonding after BTSE coating corresponded to surfaces, which did not show evidence of significant etching after exposure to a pH 4 environment. This suggests that such surfaces are more receptive to the coupling reaction during exposure to the BTSE coating solution. These surfaces include all H-2 plasma-treated samples, the heated native oxide and the sample that only received the 15 min FPL treatment. In contrast, other surfaces that show evidence of etching in pH 4 environments are samples that received lower amounts of Al-O-Si interfacial bonding. Overall, heating improved the BTSE adhesive bonding for the native Al oxide, while H-2 plasma treatment improved the BTSE bonding for surfaces that had initially been FPL-treated for 15 and 60 min. (c) 2005 Elsevier B.V All rights reserved.},
	keywords = {aluminum, ESCA, OXIDATION, PARALLEL FACTOR-ANALYSIS, silane adsorption, SILANE COUPLING AGENTS, SIMS, SPECTROSCOPY, surface pre-treatment, THIN-FILMS, TOF-SIMS, X-ray photoelectron, XPS, XPS INVESTIGATIONS, ZIRCONIUM-OXIDE},
	isbn = {0169-4332},
	url = {<Go to ISI>://000233985900014},
	author = {Teo, M. and Kim, J. and Wong, P. C. and Wong, K. C. and Mitchell, K. A. R.}
}
@article {1153,
	title = {Pre-treatments applied to oxidized aluminum surfaces to modify the interfacial bonding with bis-1,2-(triethoxysilyl)ethane (BTSE) - Part II. Anodized 7075-T6 Al alloy},
	journal = {Applied Surface Science},
	volume = {252},
	number = {5},
	year = {2005},
	note = {ISI Document Delivery No.: 993WHTimes Cited: 6Cited Reference Count: 46},
	month = {Dec},
	pages = {1305-1312},
	type = {Article},
	abstract = {The methods of X-ray pbotoelectron spectroscopy (XPS), secondary-ion mass spectrometry (SIMS), and scanning electron microscopy (SEM) have been used to investigate aspects of the bonding of bis-1,2-(triethoxysilyl)ethane (BTSE) onto anodized samples of 7075-T6 aluminum alloy that have been subjected to the various pre-treatments considered in Part I. The oxide layer thins when this sample is subjected to a Forest Products Laboratory (FPL) treatment; topographical changes are detected by SEM after only 5 min, and the "scallop structures" increase in size for longer times of the FPL treatment. These 7075-Al surfaces adsorb more BTSE than the high-purity Al samples considered in Part I, although the interfacial bonding indicated by the [AlOSi](+)/[Al2O](+) SIMS ratios measured for the former samples are constant for different times of FPL treatment, unlike the situation for high-purity Al. Heating anodized 7075-Al samples, either before or after FPL treatment, has no significant effect on the subsequent BTSE adsorption, but a H-2 plasma treatment can enhance the interfacial Al-O-Si bonding with a decrease in the total BTSE polymerization. (c) 2005 Elsevier B.V. All rights reserved.},
	keywords = {2024-T3, AGENTS, aluminum, corrosion, COUPLING, ESCA, HYDROXIDES, silane adsorption, SIMS, SPECTROSCOPY, surface pre-treatment, THIN-FILMS, X-ray photoelectron, XPS, XPS INVESTIGATIONS, ZIRCONIUM-OXIDE},
	isbn = {0169-4332},
	url = {<Go to ISI>://000233985900015},
	author = {Kim, J. and Teo, M. and Wong, P. C. and Wong, K. C. and Mitchell, K. A. R.}
}
@article {799,
	title = {Characterization of titanium chromium nitride nanocomposite protective coatings},
	journal = {Applied Surface Science},
	volume = {229},
	number = {1-4},
	year = {2004},
	note = {ISI Document Delivery No.: 824INTimes Cited: 12Cited Reference Count: 30},
	month = {May},
	pages = {387-394},
	type = {Article},
	abstract = {The structural, chemical, optical and mechanical properties of titanium chromium nitride nanocrystalline films deposited by ion beam-assisted deposition were studied by means of X-ray diffraction, X-ray photoelectron spectroscopy, spectroscopic ellipsometry, nanoindentation and wear testing. Coatings were deposited on silicon and stainless steel substrates with growth temperatures of 150 and 400 degreesC. The concentration of titanium and chromium in the film was regulated by controlling their evaporation rates. The nitrogen concentration was controlled by varying the nitrogen ion current. X-ray diffraction and X-ray photoelectron spectroscopy measurements indicated that the films deposited at 150 degreesC formed solid solutions whereas those produced at 400 degreesC formed nanocomposites. The optical constants were measured using spectroscopic ellipsometry. A correlation between the elemental/phase composition and optical constants was established. The mechanical properties of the coatings were evaluated using nanohardness testing and were found to depend on composition. The nanocomposite films were the hardest (hardness of 30 GPa and elastic modulus of 300 GPa). Tribological properties of titanium chromium nitride coated 440 C stainless steel coupons were evaluated using a ball-on-disk tribometer. These tests were conducted under a load of 50 N for 1.5 million cycles at 180 rpm. Coatings deposited at high temperature did not show any signs of wear. (C) 2004 Elsevier B.V. All rights reserved.},
	keywords = {B-N, DEPOSITION, ellipsometry, HARD COATINGS, NANOSTRUCTURES, nitrides, SPECTROSCOPY, sputtering, THIN-FILMS, WEAR-RESISTANT COATINGS, X-ray photoelectron},
	isbn = {0169-4332},
	url = {<Go to ISI>://000221680100050},
	author = {Aouadi, S. M. and Wong, K. C. and Mitchell, K. A. R. and Namavar, F. and Tobin, E. and Mihut, D. M. and Rohde, S. L.}
}
@article {949,
	title = {Electron binding energies of Si 2p and S 2p for Si- and S-containing substances by DFT calculations using the model molecules},
	journal = {Polymer Journal},
	volume = {36},
	number = {8},
	year = {2004},
	note = {ISI Document Delivery No.: 860UCTimes Cited: 2Cited Reference Count: 39},
	pages = {600-606},
	type = {Article},
	abstract = {Si 2p and S 2p core-electron binding energies (CEBE)s of Si- and S-containing molecules were calculated by deMon DFT program using Slater{\textquoteright}s transition-state (TS) concept. In the previous works, we could not obtain the calculated values to the experimental ones of third periodic 2p CEBEs for the molecules within the range of averaged absolute deviation (AAD) of 1.0eV, although the values were calculated by the unrestricted generalized transition-state (uGTS) method. Here, we were able to get the reasonable Si 2p and S 2p CEBEs of 11, and 12 gas molecules in the AAD of 0.37 and 0.46 eV, respectively from the CEBE calculations by the unrestricted generalized diffuse ionization (uGDI) method with a modification of screening constants for third periodic elements of the 2p core-hole. Furthermore, we estimated WD (work function and the other energies) values of seven Si- and S-containing polymers [(Si(CH3)(2))(n) (PDMS), (Si(CH3)(2)O)(n), (PDMSO), (Si(C6H5)CH3)(n) (PMPS), (Si(C6H5)CH3O)(n) (PPMSO), ((CH2CH2)S)(n) (PETHS), ((CH2(CH2)(4)CH2)SO2). (PHMS), ((C6H4)S)(n) (PPS)] from the differences between calculated CEBE values for the model molecules and experimental ones on the solid polymers.},
	keywords = {APPROXIMATION, CALCULATIONS, CORE, core-electron binding energy, DENSITY-FUNCTIONAL THEORY, DFT, EMISSION-SPECTRA, ESCA, FILMS, FLUORESCENCE, ION IRRADIATION, POLYMER CONVERSION, X-ray photoelectron, X-ray photoelectron spectra},
	isbn = {0032-3896},
	url = {<Go to ISI>://000224367800004},
	author = {Motozaki, W. and Otsuka, T. and Endo, K. and Chong, D. P.}
}
@article {4330,
	title = {XPS studies of the nitridation of MoO3 thin films on alumina and silica supports},
	journal = {Applied Surface Science},
	volume = {136},
	number = {3},
	year = {1998},
	note = {ISI Document Delivery No.: 140QWTimes Cited: 3Cited Reference Count: 40},
	month = {Nov},
	pages = {178-188},
	type = {Article},
	abstract = {X-ray photoelectron spectroscopy has been used to characterize thin films of MoO3 formed on planar oxidized supports, namely AlOx (from aluminum strip) and SiO2 (from silicon wafer). Comparisons are made with behaviour for MoO3 on metallic Mo substrate. It is observed that on calcination at 450 degrees C, the Mo 3d spectral features shift to higher binding energy for MoO3/AlOx and to lower binding energy for MoO3/SiO2, On nitridation by heating in NH3, it is found that the samples on the oxide supports show easier O-N replacement compared with the MoO3/Mo system. In general, the nitridation behaviour for MoO3/AlO, is similar to that of MoO3/Mo, but Mo species in MoO3/SiO2 seem to be more easily reduced (Mo(0) is detected for the SiO2 system but not for AlOx). Comparisons of heating rates for the second nitridation step from 350 to 450 degrees C were made for the MoO3/Mo and MoO3/AlOx samples. Differences between the high heating rate (100 K/h) and the low heating rate (40 K/h) are incremental but definite. The lower heating rate is favourable both for the O-N replacement and for the metal reduction. For example, more Mo(+3) is present after the nitridation to 450 degrees C when the low-heating rate regime is used, compared with that formed when the heating is done at the higher rate. (C) 1998 Elsevier Science B.V. All rights reserved.},
	keywords = {ADSORPTION, BEHAVIOR, CARBIDE, HYDRODENITROGENATION CATALYSTS, HYDRODESULFURIZATION, MOLYBDENUM NITRIDE, MoO3 thin films, nitridation, QUINOLINE, SITES, SURFACE-AREA, THIOPHENE, X-ray photoelectron, X-ray photoelectron spectroscopy},
	isbn = {0169-4332},
	url = {<Go to ISI>://000077100700002},
	author = {Leung, Y. L. and Wong, P. and Zhou, M. Y. and Mitchell, K. A. R. and Smith, K. J.}
}
