@article {3563,
	title = {XPS INVESTIGATIONS OF THE INTERACTIONS OF HYDROGEN WITH THIN-FILMS OF ZIRCONIUM-OXIDE .1. HYDROGEN TREATMENTS ON A 10-ANGSTROM THICK-FILM},
	journal = {Applied Surface Science},
	volume = {89},
	number = {3},
	year = {1995},
	note = {ISI Document Delivery No.: RG147Times Cited: 19Cited Reference Count: 19},
	month = {Jul},
	pages = {255-261},
	type = {Article},
	abstract = {Interactions of hydrogen with the interface formed between ZrO2 and zirconium suboxide (ZrOx, x < 2) were studied on a 10 Angstrom zirconium oxide film prepared on gold foil for X-ray photoelectron spectroscopy (XPS) analysis. This film was subject to a set of sequential treatments. Reaction with II, gas at 2 mbar pressure and room temperature indicates that the ZrO2/ZrOx interface appeared to undergo a redox-type reaction and convert to a new ZrO2/ZrOy (x < y < 2) film. Heating this structure at 300 degrees C in a 10(-9) mbar vacuum (residual gas dominantly H2O) resulted in more ZrO2 in the outer region and less ZrO, in the subsurface. By contrast, when this film was treated with a hydrogen plasma, XPS showed enhanced formation of -OH groups and complete conversion to the ZrO2-like form. On heating to 300 degrees C, this uniform film regenerates the ZrO2/ZrOy interface structure, apparently with desorption of H2O.},
	keywords = {OXYGEN, RAY PHOTOELECTRON-SPECTROSCOPY, SIMS, SURFACE OXIDATION, ZRO2},
	isbn = {0169-4332},
	url = {<Go to ISI>://A1995RG14700005},
	author = {Wong, P. C. and Li, Y. S. and Zhou, M. Y. and Mitchell, K. A. R.}
}
@article {3425,
	title = {XPS INVESTIGATIONS OF THE INTERACTIONS OF HYDROGEN WITH THIN-FILMS OF ZIRCONIUM-OXIDE .2. EFFECTS OF HEATING A 26-ANGSTROM THICK-FILM AFTER TREATMENT WITH A HYDROGEN PLASMA},
	journal = {Applied Surface Science},
	volume = {89},
	number = {3},
	year = {1995},
	note = {ISI Document Delivery No.: RG147Times Cited: 32Cited Reference Count: 19},
	month = {Jul},
	pages = {263-269},
	type = {Article},
	abstract = {In order to help establish the role hydrogen plays in the oxidation and reduction of zirconium oxide thin films, XPS was used to study the effects of heating a 26 Angstrom thick ZrO2 film after a hydrogen-plasma treatment. The latter treatment produced a uniform hydrogen-trapped ZrO2 film. Heating to 425 degrees C yielded a reduced suboxide, ZrOx, particularly in the deeper regions of the film, but near the surface this heating produced a zirconium state with Zr3d(5/2) binding energy at 183.4 eV, which is higher than that of ZrO2 by about 0.5 eV. This new chemical state of zirconium appears especially related to Zr-OH bonding. This result, with the observed inhomogeneity of the film, strongly suggests that either H2O or OH- species migrate to the surface region of the hydrogen-trapped ZrO2 film during the heating process.},
	keywords = {AES, EELS, SPECTRA, ZRO2},
	isbn = {0169-4332},
	url = {<Go to ISI>://A1995RG14700006},
	author = {Li, Y. S. and Wong, P. C. and Mitchell, K. A. R.}
}
@article {7314,
	title = {THE GROWTH OF ZIRCONIUM-OXIDE THIN-FILMS ON AU(111) SINGLE-CRYSTAL SURFACES},
	journal = {Applied Surface Science},
	volume = {62},
	number = {3},
	year = {1992},
	note = {ISI Document Delivery No.: JR191Times Cited: 9Cited Reference Count: 30},
	month = {Oct-Nov},
	pages = {175-180},
	type = {Article},
	abstract = {The deposition on to a Au(111) surface of a few monolayers of zirconium in an oxygen atmosphere at 10(-7) Torr can yield, after a brief anneal at around 1025 K, thin crystalline films of cubic zirconium oxide grown parallel to the (111) plane- These observations quite closely parallel those in a recent report for epitaxial ZrO2 growth on Pt(111), and the samples produced appear suitable for the surface science study of this material. Contrasting growth modes are observed depending on whether or not the substrate is gently annealed during the deposition process. With prolonged heating of the ZrO2 film at 1025 K, or above, there is a decrease in the Auger signals of both Zr and O, and an increase for Au.},
	keywords = {ALLOYS, COATINGS, DIFFUSION, METALLIC-GLASS FORMATION, VAPOR-DEPOSITION, ZRO2},
	isbn = {0169-4332},
	url = {<Go to ISI>://A1992JR19100009},
	author = {Lou, J. R. and Hess, U. and Mitchell, K. A. R.}
}
