@article {798,
	title = {Titanium boron nitride films grown by ion beam assisted deposition: chemical and optical characterization},
	journal = {Surface \& Coatings Technology},
	volume = {183},
	number = {2-3},
	year = {2004},
	note = {ISI Document Delivery No.: 822CMTimes Cited: 4Cited Reference Count: 41},
	month = {May},
	pages = {369-377},
	type = {Article},
	abstract = {Titanium boron nitride films with a functionally graded underlayer of Ti/TiN were grown at low temperatures ( < 200 degreesC) on a silicon substrate using ion beam assisted deposition. These coatings had a total thickness of 1.5 +/- 0.2 mum. They were characterized using X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry. The primary phases in the film were identified using XRD and were found to be in agreement with the equilibrium phase diagram. The surface morphology and nanocrystalline nature of the coating were deduced using AFM. The chemical and phase composition was determined from XPS measurements. The refractive indices were deduced from the investigation of the ellipsometric data and were subsequently correlated to the elemental and phase composition. The hardness and elastic modulus were measured and were found to depend on phase composition. The films were implanted with carbon ions. XPS measurements revealed that new phases formed at the surface as a result of carbon implantation, namely, titanium carbide and elemental carbon. Carbon implantation significantly reduced the friction coefficient from 0.5-0.7 to 0.15-0.25. The hardness of the films decreased by 2-5\%. (C) 2003 Elsevier B.V. All rights reserved.},
	keywords = {B-N COATINGS, ellipsometry, HARD COATINGS, ion beam assisted deposition, MECHANICAL-PROPERTIES, nanocrystal, NITRIDE, SUPERHARD NANOCOMPOSITE COATINGS, THIN-FILMS, TIBXNY COATINGS, X-ray photoelectron spectroscopy},
	isbn = {0257-8972},
	url = {<Go to ISI>://000221512300031},
	author = {Aouadi, S. M. and Debessai, M. and Namavar, E. and Wong, K. C. and Mitchell, K. A. R.}
}
@article {617,
	title = {Dinuclear organometallic dinitrogen complexes of niobium},
	journal = {Inorganica Chimica Acta},
	volume = {345},
	year = {2003},
	note = {ISI Document Delivery No.: 653EUTimes Cited: 4Cited Reference Count: 30},
	month = {Mar},
	pages = {53-62},
	type = {Article},
	abstract = {{The niobium(III) chloride precursors (R)[P2N2]NbCl stabilized by the bis-(amidophosphine) macrocycle (where (R)[P2N2] RP(CH2SiMe2NSiMe2CH2)(2)PR},
	keywords = {ACTIVATION, amidophosphine ligands, AZOBENZENE, CLEAVAGE, CRYSTAL-STRUCTURE, CRYSTALLOGRAPHY, DINITROGEN COMPLEXES, END-ON, FIXATION, fluxionality, macrocycle, macrocycles, N-2, NIOBIUM, NITRIDE, SIDE-ON},
	isbn = {0020-1693},
	url = {<Go to ISI>://000181422900008},
	author = {Fryzuk,Michael D. and Kozak, C. M. and Patrick, B. O.}
}
@article {3186,
	title = {TENSOR LEED ANALYSIS OF THE CU(110)-(2 X 3)-N SURFACE-STRUCTURE},
	journal = {Physical Review B},
	volume = {49},
	number = {16},
	year = {1994},
	note = {ISI Document Delivery No.: NK063Times Cited: 27Cited Reference Count: 25},
	month = {Apr},
	pages = {11515-11518},
	type = {Note},
	abstract = {A tensor LEED analysis of the Cu(110)-(2 x 3)-N surface structure supports. a reconstruction model in which the topmost layer can be described as a pseudo-(100)-c(2 x 2)-N overlayer, with metal corrugation of about 0.52 angstrom in the reconstructed layer. Each N atom is nearly coplanar with the local plane formed by the four neighboring Cu atoms. Of the four N atoms per unit mesh, three also bond to Cu atoms in the layer below and are therefore five-coordinate. Two of the three five-coordinate sites result from appreciable lateral displacements toward each other of both N atoms and Cu atoms below in the topmost Cu(110) layer. Average N-Cu bond lengths for the five-coordinate sites (1.87 angstrom) agree well with prediction, while the bond lengths for the four-coordinate sites (1.85 angstrom) appear somewhat long. These different N sites are discussed in relation to a recent STM study, and results from this LEED analysis are contrasted with those from the previous LEED study, which supported a [001]-missing row reconstruction of the surface.},
	keywords = {CU(110)(2X3)-N STRUCTURE, ENERGY-ELECTRON-DIFFRACTION, ION-SCATTERING, NITRIDE, NITROGEN, RECONSTRUCTION, SITE, SUBSTRATE},
	isbn = {0163-1829},
	url = {<Go to ISI>://A1994NK06300093},
	author = {Vu, D. T. and Mitchell, K. A. R.}
}
@article {7249,
	title = {LEED CRYSTALLOGRAPHIC STUDIES FOR THE CU(110)-(2 X 3)-N SURFACE-STRUCTURE},
	journal = {Surface Science},
	volume = {271},
	number = {3},
	year = {1992},
	note = {ISI Document Delivery No.: JA639Times Cited: 19Cited Reference Count: 31},
	month = {Jun},
	pages = {519-529},
	type = {Article},
	abstract = {An initial multiple-scattering analysis of LEED intensities has been performed for the Cu(110)-(2 x 3)-N surface structure. R-factor analysis supports neither simple N overlayer models nor models with Cu(100)-type top-layer reconstructions. The best correspondence between calculated and experimental intensities appears with models where every other [001] row is missing, similar to that observed for the Cu(110)-(2 x 1)-O surface. The favoured surface structure has N atoms chemisorbed on long-bridge sites such that chains of (Cu(a)-N-Cu(b)-N-Cu(a))x create a surface analogous to the ideal Cu3N(110) surface, except that every third N atom is missing from the surface chains. There is evidence that lateral displacement of copper atoms from the ideal positions leads to two different N-Cu surface bond lengths with values near 1.83 and 1.90 angstrom. Each N atom also bonds to two Cu atoms in the second layer with equal bond lengths of about 1.88 angstrom.},
	keywords = {ADSORPTION, AES, chemisorption, CU(110)(2X3)-N STRUCTURE, ENERGY ELECTRON-DIFFRACTION, NI(110), NITRIDE, NITROGEN, RECONSTRUCTION, SITE},
	isbn = {0039-6028},
	url = {<Go to ISI>://A1992JA63900025},
	author = {Grimsby, D. T. V. and Zhou, M. Y. and Mitchell, K. A. R.}
}
