@article {7162,
	title = {CHARACTERIZATION OF SPUTTER DEPOSITED TUNGSTEN FILMS FOR X-RAY MULTILAYERS},
	journal = {Journal of Vacuum Science \& Technology a-Vacuum Surfaces and Films},
	volume = {10},
	number = {2},
	year = {1992},
	note = {ISI Document Delivery No.: HK010Times Cited: 27Cited Reference Count: 24},
	month = {Mar-Apr},
	pages = {273-280},
	type = {Article},
	abstract = {The microstructural and optical properties of tungsten thin films prepared by dc magnetron sputtering were investigated as a function of the argon pressure. The films were characterized by x-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), x-ray diffraction (XRD), grazing x-ray reflectometry (GXR), and spectroscopic ellipsometry (SE). From the analysis of the XPS data, the films were found to consist of a base tungsten layer, a graded oxide transition layer, and a surface oxide layer. Also, the thickness of the oxide layers were determined. XRD indicated that the films were either amorphous or composed of crystallites with grain size < 100 angstrom. STM and GXR have revealed that the films grown at low pressures were the smoothest. Finally, SE measurements allowed the determination of the dielectric function of a compact tungsten layer. Further SE analysis of the films indicated that with increasing argon pressure, the films developed into a more voided columnar structure.},
	keywords = {SILICON, SURFACE},
	isbn = {0734-2101},
	url = {<Go to ISI>://A1992HK01000002},
	author = {Aouadi, M. S. and Parsons, R. R. and Wong, P. C. and Mitchell, K. A. R.}
}
