@article {3564,
	title = {XPS STUDIES OF THE STABILITY OF A MIXED ZIRCONIUM-OXIDE AND SULFIDE THIN-FILM},
	journal = {Surface Review and Letters},
	volume = {2},
	number = {2},
	year = {1995},
	note = {ISI Document Delivery No.: RD591Times Cited: 1Cited Reference Count: 12},
	month = {Apr},
	pages = {165-169},
	type = {Article},
	abstract = {A 25 Angstrom film formed by depositing zirconium (similar to 2 Angstrom min(-1)) onto gold foil in the presence of H2S (similar to 5 X 10(-8) mbar) and H2O (similar to 1 X 10(-9) mbar) has been studied by XPS. This film has an outer region composed of a mixed zirconium oxide/sulphide, while below there is metallic zirconium plus Zr/Au alloy in contact with gold. This film appears stable on heating to 400 degrees C under UHV insofar as the sulphide part does not change, although the oxide part increases apparently as a result of some reaction of metallic zirconium with ambient water. By contrast, when this preheated film at room temperature was treated with a hydrogen plasma, the sulphide component was completely removed and the whole film was converted to the ZrO2-like form with enhanced formation of OH groups. The hydrogen plasma treatment is therefore capable of desulphurising the mixed zirconium oxide/sulphide film.},
	keywords = {OXYGEN, SURFACE},
	isbn = {0218-625X},
	url = {<Go to ISI>://A1995RD59100005},
	author = {Wong, P. C. and Li, Y. S. and Zhou, M. Y. and Mitchell, K. A. R.}
}
