@article {3746,
	title = {XPS investigations of the reactivities of oxidized Zr/Nb interfaces formed by deposition on a gold substrate},
	journal = {Applied Surface Science},
	volume = {103},
	number = {4},
	year = {1996},
	note = {ISI Document Delivery No.: VX979Times Cited: 6Cited Reference Count: 18},
	month = {Dec},
	pages = {389-393},
	type = {Article},
	abstract = {The interaction of a film of Zr (similar to 38 Angstrom thick) deposited under ultrahigh vacuum (UHV) on to an approximately 12 Angstrom film of NbO on a gold substrate has been studied with X-ray photoelectron spectroscopy (XPS). Evidence is presented for an interfacial conversion from Zr and NbO to ZrO2 and Nb. The reactivity of this sample was studied through a series of sequential treatments. Although changes occur in the topmost layer, the Zr/Nb interfacial region, as identified by a shoulder at similar to 180 eV in Zr 3d and the 203.0 eV peak in Nb 3d, appears to be remarkably inert on heating at 300 degrees C under UHV, as well as on subjecting to O-2 and hydrogen plasma treatments.},
	keywords = {corrosion, HYDROGEN, NUCLEAR-REACTION ANALYSIS, THIN-FILMS, WT-PERCENT NB, ZIRCALOY-2, ZIRCONIUM-OXIDE, ZR},
	isbn = {0169-4332},
	url = {<Go to ISI>://A1996VX97900009},
	author = {Li, Y. S. and Wong, K. C. and Wong, P. C. and Mitchell, K. A. R.}
}
