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XPS STUDIES OF THE STABILITY OF A ZIRCONIUM CARBIDE FILM IN THE PRESENCE OF ZIRCONIUM-OXIDE AND HYDROGEN

TitleXPS STUDIES OF THE STABILITY OF A ZIRCONIUM CARBIDE FILM IN THE PRESENCE OF ZIRCONIUM-OXIDE AND HYDROGEN
Publication TypeJournal Article
Year of Publication1995
AuthorsWong, PC, Li, YS, Mitchell, KAR
JournalSurface Review and Letters
Volume2
Pagination297-303
Date PublishedJun
Type of ArticleArticle
ISBN Number0218-625X
KeywordsZR
Abstract

X-ray photoelectron spectroscopy (XPS) has been used to study the interfacial chemistries of a 65-Angstrom film prepared by depositing zirconium in an oxidizing environment onto a methane-pretreated 11-Angstrom thick zirconium oxide film, which initially was deposited onto a gold substrate. The second metal deposition results in an outermost region composed of a mixed zirconium oxide, while below there is metallic zirconium followed by zirconium carbide and carbon on top of the first zirconium oxide film, which is itself in contact with the gold. The carbide component showed no changes on heating to 425 degrees C, on treating with a hydrogen plasma at room temperature, or on heating the resulting film to 425 degrees C. The oxide layers do show characteristic changes, and this also contrasts with earlier observations for a zirconium sulphide film. The zirconium carbide Zr3d(5/2) component has a binding energy of 180.6 eV.

URL<Go to ISI>://A1995RK60600004