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APPLICATION OF WEAKLY IONIZED PLASMAS FOR MATERIALS SAMPLING AND ANALYSIS

TitleAPPLICATION OF WEAKLY IONIZED PLASMAS FOR MATERIALS SAMPLING AND ANALYSIS
Publication TypeJournal Article
Year of Publication1991
AuthorsBlades, MW, Banks, P, Gill, C, Huang, DG, Leblanc, C, Liang, D
JournalIeee Transactions on Plasma Science
Volume19
Pagination1090-1113
Date PublishedDec
Type of ArticleReview
ISBN Number0093-3813
KeywordsARGON PLASMA, ATMOSPHERIC-PRESSURE, ATOMIC EMISSION-SPECTROSCOPY, DC, FLUORESCENCE SPECTROMETRY, GLOW-DISCHARGE SOURCE, HOLLOW-CATHODE DISCHARGE, INDUCTIVELY-COUPLED PLASMA, MICROWAVE-INDUCED PLASMAS, NONTHERMAL EXCITATION, SOURCE-MASS SPECTROMETRY, SPECTROMETRY
Abstract

The use of weakly ionized plasmas as spectroscopic sources for materials sampling and analysis is reviewed. Plasma sources currently used for this purpose include dc and ac plasmas, inductively coupled plasmas, microwave-induced plasmas, surface-wave plasmas, capacitively coupled plasmas, capacitive microwave plasmas, glow discharges, flowing afterglows, Theta pinch discharges, exploding films and wires, and laser-produced plasmas.

URL<Go to ISI>://A1991HD29500009